Volume 53, Issue 1 p. 727-728
Book 2: Session 55: Advanced Manufacturing Process Technologies

55-2: Roll-to-Plate Nanoimprint Lithography as Etching Mask Creating Large-Area Structured Surfaces

Jan Matthijs ter Meulen

Corresponding Author

Jan Matthijs ter Meulen

Morphotonics B.V., Veldhoven, The Netherlands

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L.W. (Pim) Veldhuizen

L.W. (Pim) Veldhuizen

Morphotonics B.V., Veldhoven, The Netherlands

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Danielle A.C. van der Heijden

Danielle A.C. van der Heijden

Morphotonics B.V., Veldhoven, The Netherlands

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Erhan Ercan

Erhan Ercan

Morphotonics B.V., Veldhoven, The Netherlands

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Bram J.F. Titulaer

Bram J.F. Titulaer

Morphotonics B.V., Veldhoven, The Netherlands

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First published: 28 June 2022

Abstract

This paper explains how large area Roll-to-Plate (R2P) Nanoimprinting is combined with Reactive Ion Etching (RIE) to address the emerging needs of a variety of demanding products. In this process sequence, the scalable R2P imprint process is used to apply a structured mask to the functional surface. In a subsequent etching step the texture is transferred into the layer underneath. Using nanoimprinting and dry-etching in combination is a powerful method for creating large-area metal structured surfaces or optical structures in glass while improving mechanical durability and optical clarity at reduced costs and in larger volumes.